MTSE 5520 - Physical and Chemical Basis of Integrated Circuit Fabrication

3 hours

Current requirements and future trends in processing technology for very large scale integrated circuits and related application. Wafer fabrication, lithography, oxidation, diffusion, ion implantation, film deposition, wet and dry etching, multilevel metal interconnect, process integration and process simulation.

Prerequisite(s): MTSE 5500 or consent of department.